Elemento filtrante fotorresistente

Pullner’s photoresist filter element uses a natural hydrophilic nylon 6,6 membrane with HDPE support and end caps, engineered to filter photoresist and developer in semiconductor and electronics manufacturing. Its low differential pressure, fast start-up, and minimal bubble generation reduce photochemical waste and improve process yield.

Caudal
500 GPM
Micron Rating
5, 10, 25 μm
Max Temperature
up to 80°C
MembraneHydrophilic Nylon 6,6
Core, Cage, End CapsHigh Density Polyethylene (HDPE)
O-ring OptionsViton, EPR
Removal Ratings20nm, 40nm, 0.1 micron, 0.2 micron
WettabilitySpontaneous (no pre-wetting required)
CertificacionesISO 9001

Why Choose Pullner Filter?

Más que un simple proveedor: somos su socio técnico en soluciones de filtración

Laboratory and Testing Facilities

In-house testing capabilities for materials and quality assurance with advanced equipment and certified technicians.


  • Particle counting analysis
  • Pressure drop testing
    Material
  • compatibility testing

Design and R&D Services

Position as technical partner, not just supplier. Custom solutions for your unique challenges.

  • Custom filter design
  • System optimization
  • Technical consultation

Free Services

Comprehensive free services to support your filtration needs without any hidden costs.


  • Free testing for filtration systems
  • Free custom filtration design
  • Up to 2 free samples

Global Manufacturing

State-of-the-art manufacturing facilities with worldwide delivery capabilities and local support.

  • ISO 9001 certified facilities
  • Global logistics network
  • Local technical support
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