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Natural hydrophilic nylon 6,6 wets spontaneously on contact with aqueous photoresist and developer without any pre-wetting step, which eliminates the startup bubbles that cause coating non-uniformity and yield loss in photolithography. The quick-vent design allows any residual gas to escape immediately, so the element reaches full flow from the first cycle. All hardware (core, cage, end caps, support, and drainage layers) is HDPE, minimising metallic extractables that could contaminate sensitive photochemical fluids.<\\\/p>\"}]","_product_tab_features":"","_product_tab_specs":"
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