{"id":8826,"date":"2026-03-06T09:50:46","date_gmt":"2026-03-06T09:50:46","guid":{"rendered":"https:\/\/www.staging.pullnerfilter.com\/product\/photoresist-filter-element\/"},"modified":"2026-04-08T12:15:14","modified_gmt":"2026-04-08T12:15:14","slug":"photoresist-filter-element","status":"publish","type":"product","link":"https:\/\/www.staging.pullnerfilter.com\/ar\/product\/photoresist-filter-element\/","title":{"rendered":"\u0639\u0646\u0635\u0631 \u0627\u0644\u0645\u0631\u0634\u062d \u0627\u0644\u0636\u0648\u0626\u064a"},"content":{"rendered":"<p>Pullner&#8217;s photoresist filter element uses a natural hydrophilic nylon 6,6 membrane with HDPE support and end caps, engineered to filter photoresist and developer in semiconductor and electronics manufacturing. Its low differential pressure, fast start-up, and minimal bubble generation reduce photochemical waste and improve process yield.<\/p>","protected":false},"featured_media":2091,"menu_order":0,"template":"","meta":{"_acf_changed":false,"_seopress_robots_primary_cat":"none","_seopress_titles_title":"","_seopress_titles_desc":"","_seopress_robots_index":"","_uag_custom_page_level_css":"","site-sidebar-layout":"default","site-content-layout":"","ast-site-content-layout":"default","site-content-style":"default","site-sidebar-style":"default","ast-global-header-display":"","ast-banner-title-visibility":"","ast-main-header-display":"","ast-hfb-above-header-display":"","ast-hfb-below-header-display":"","ast-hfb-mobile-header-display":"","site-post-title":"","ast-breadcrumbs-content":"","ast-featured-img":"","footer-sml-layout":"","theme-transparent-header-meta":"","adv-header-id-meta":"","stick-header-meta":"","header-above-stick-meta":"","header-main-stick-meta":"","header-below-stick-meta":"","astra-migrate-meta-layouts":"set","ast-page-background-enabled":"default","ast-page-background-meta":{"desktop":{"background-color":"","background-image":"","background-repeat":"repeat","background-position":"center center","background-size":"auto","background-attachment":"scroll","background-type":"","background-media":"","overlay-type":"","overlay-color":"","overlay-opacity":"","overlay-gradient":""},"tablet":{"background-color":"","background-image":"","background-repeat":"repeat","background-position":"center center","background-size":"auto","background-attachment":"scroll","background-type":"","background-media":"","overlay-type":"","overlay-color":"","overlay-opacity":"","overlay-gradient":""},"mobile":{"background-color":"","background-image":"","background-repeat":"repeat","background-position":"center center","background-size":"auto","background-attachment":"scroll","background-type":"","background-media":"","overlay-type":"","overlay-color":"","overlay-opacity":"","overlay-gradient":""}},"ast-content-background-meta":{"desktop":{"background-color":"var(--ast-global-color-5)","background-image":"","background-repeat":"repeat","background-position":"center center","background-size":"auto","background-attachment":"scroll","background-type":"","background-media":"","overlay-type":"","overlay-color":"","overlay-opacity":"","overlay-gradient":""},"tablet":{"background-color":"var(--ast-global-color-5)","background-image":"","background-repeat":"repeat","background-position":"center center","background-size":"auto","background-attachment":"scroll","background-type":"","background-media":"","overlay-type":"","overlay-color":"","overlay-opacity":"","overlay-gradient":""},"mobile":{"background-color":"var(--ast-global-color-5)","background-image":"","background-repeat":"repeat","background-position":"center center","background-size":"auto","background-attachment":"scroll","background-type":"","background-media":"","overlay-type":"","overlay-color":"","overlay-opacity":"","overlay-gradient":""}},"_product_flow_rate":"500 GPM","_product_micron":"5, 10, 25 \u03bcm","_product_temp":"up to 80\u00b0C","_product_sku":"","_product_mpn":"","_product_description":"Hydrophilic nylon 6,6 photoresist filter with low differential pressure and minimal bubble generation for semiconductor photolithography processes.","_product_gallery":"","_product_tabs":"[{\"title\":\"Product Details\",\"content\":\"<p>Natural hydrophilic nylon 6,6 wets spontaneously on contact with aqueous photoresist and developer without any pre-wetting step, which eliminates the startup bubbles that cause coating non-uniformity and yield loss in photolithography. The quick-vent design allows any residual gas to escape immediately, so the element reaches full flow from the first cycle. 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